Conventional photolithography relies on either direct laser writing with a high-NA lens, or on projection steppers that image a high-resolution photomask into a substrate

We aim to replace conventional optics with flat optics that can harness the best of both worlds: Direct laser writing and masked-based lithography

By using metasurfaces and spatial light modulators, it is possible to speed up direct laser writing to near masked lithography speeds while maintaining the advantages of maskless writing